High Purity Titanium Sputtering Target is a premium vacuum coating material manufactured from high-purity titanium through advanced vacuum melting and thermo-mechanical processing technologies.

With purity levels up to 99.999%, titanium targets provide excellent film quality, stable sputtering performance, and superior uniformity, making them widely used in semiconductor manufacturing, photovoltaic coatings, decorative coatings, and advanced thin-film applications.

The high purity and excellent physical properties of titanium ensure low contamination, stable deposition rates, and high-quality coating performance for precision coating processes.

Technical Specifications

Item	Specification
Product Name	High Purity Forged Industrial Titanium Target
Material	Titanium (Ti)
Purity	99.99% – 99.999%
Shape	Round / Square / Customized
Manufacturing Process	Vacuum Melting + Thermo-mechanical Processing
Surface Condition	Machined / Polished according to customer requirements
Certification	ISO9001, SGS, Third-party Test Report
Customization	Available

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Available Dimensions

Round Titanium Target

Size：Ø2 × 3 mm Ø2 × 5 mm Ø3 × 6 mm

Rectangular Titanium Target

Purity	Size
99.99%	4 × 4 mm
99.999%	6 × 6 mm

Customized dimensions are available according to customer drawings and coating equipment requirements.

Manufacturing Process

1. Vacuum Melting

High-purity titanium raw materials are melted under vacuum conditions to minimize impurities and ensure excellent chemical composition control.

2. Thermo-mechanical Processing

Advanced forging and thermal treatment technologies improve:

Material density

Grain structure

Mechanical stability

Sputtering uniformity

3. Precision Machining

The titanium target is machined according to customer specifications to achieve accurate dimensions and surface quality.

4. Quality Inspection

Each target undergoes strict inspection including:

Chemical composition analysis

Purity verification

Dimensional inspection

Surface quality inspection

Third-party testing when required

Key Features

Ultra High Purity

Purity up to 99.999% minimizes contamination during sputtering and improves coating quality.

Excellent Sputtering Performance

Provides stable sputtering rates, uniform deposition, and excellent film consistency.

High Density Structure

Advanced manufacturing technology ensures a compact structure with low defect levels.

Customized Solutions

Available in various shapes, sizes, and specifications to meet different sputtering system requirements.

Reliable Quality Control

Manufactured under ISO quality management systems with professional inspection procedures.

Applications

Solar Photovoltaic Industry

Used for:

Solar cell thin-film coatings

Conductive layer deposition

Functional protective coatings

Semiconductor Industry

Applied in:

Semiconductor wafer coating

Integrated circuit manufacturing

Electronic component metallization

Decorative Coating Industry

Used for:

PVD decorative coatings

Wear-resistant surface coatings

High-end appearance coatings

Other Applications

Vacuum coating systems

Optical coating

Functional thin films

Advanced material research

Why Choose High Purity Titanium Target?

Titanium sputtering targets offer an excellent combination of:

 Ultra-high purity
 Stable sputtering performance
 Excellent film adhesion
 Low contamination risk
 High coating uniformity
 Long service life
 Customized manufacturing capability

High purity titanium targets are an ideal choice for advanced vacuum coating applications requiring reliable performance and superior film quality.

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