Metal Alloy targets

TiAl50:50at% Sputtering Target For Brown Color

Ti50%Al50% sputtering Target, TiAl alloy sputtering target, titanium-aluminum alloy target at:50%
Purity:>99.8% (2N8)
Grain Size:<100um
Process:HIP
Shape:Rectangular target,...
Chromium Target

Chromium target,Cr target,Chromium sputtering target
Purity:99.5%-99.99%
Rectangular target, Round target,rotary target
Forming process: hot isostatic...
Zirconium sputtering target

Zirconium targets,Zirconium planar target,Zr sputtering target
Purity:>99.5%
Dimension:
12x131x1214mm as drawing
12x132x1701mm as drawing
18x164x1810mm as drawing or other...
Nickel Ni Pellets and particle used for Evaporated electrode

99.99%-99.999% nickel granule|pellet|slugs for evaporation material Evaporation coating and Smelting alloy metal
Molybdenum Pellets

Molybdenum Mo pellets particles granules for Vacuum coating
purity: 99.95%(3N5)
Dimensions: 6*6mm square,2x5mm round,3x3mm or customized size
Technic: Wire electrode...
Evaporation Materials Titanium Granules Pellets Particles

Purity 99.99%~99.999% Ti titanium granules pellets particles for vacuum coating MOQ:1kg
99.95% Niobium Pellets

niobium (Nb) pellet,niobium Evaporation material
Purity:99.95%～99.99%
Application:widely used in coating processing industries
Dimension:1-10mm,0.1~10*2~20*2~20 Square/Round,...
Titanium Rotating Cylinder Target

Titanium Rotary Target for magnetron sputtering
progress:Vacuum Melting,CNC,Extruded
Purity:99.9%，99.95%，99.99%
Shape:rotary,cylinder,tube
Size:OD141*ID125*L1550mm,or as...
Multi Arc Chrome Cr Cathode Target

Chromium targets;Chromium Sputtering Targets
Material:Chrome Cr
Purity:Ranging from 99.9%(3N) - 99.99%(4N) Size:Dia100mm×40mm;Dia100mm×45mm;Dia100mm×50mm;Dia80mm×40mm;Dia60mm×30mm or...
Titanium round Target For PVD Coating

Titanium target,titanium sputtering target,titanium round target,titanium disc Size: Dia100mm×40mm Dia100mm×45mm Dia100mm×50mm Dia80mm×40mm Dia60mm×30mm or...
Titanium dioxide TiO2 ceramic sputtering target

Ceramic sputtering target,titanium oxide sputtering target,TiO2 sputtering target
Round:OD25.4mm,OD50mm,OD50.8mm,OD60mm,OD76.2mm,OD80mm,OD101.6mm,OD100mm or as...
Titanium Sputtering Target For Decoration And Mould Field

titanium sputtering target,titanium round target,titanium plate target,titanium rotary target Purity:99.7%-99.995%(3N-4N5) Grain size:<100um Application: 1.architectural glass,car using...

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Fully reacted oxide, nitrides, and even exotic carbides and selenides are essential to thin film technology because metal targets enable the formation of metal films. There are challenges to the production of Metal Alloy targets that must be met in order to meet the demands for coatings with high density and high performance, which have an impact on process control and repeatability. Past the extraction, decontamination and unrefined substance source advancements, naturally visible disappointment modes are all around as differed as the development innovations themselves.

At the point when a metal or compound is respectful, it will liquefy uniformly, outgas unstable pollutions, and permit thermo-mechanical handling to refine the grain structure and limit lingering pressure. For these materials Vacuum Acceptance Softening (VIM) is the most widely recognized and adaptable procedure for delivering suitable objective plate stock from high virtue beginning bar, bar, turnings and foils. The Metal Alloy targets is softened and projected into an objective form. Ensuing thermo-mechanical handling including hot rolling, strengthening and machining, further refine the construction as displayed in Figure 1.

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