Titanium Sputtering Target For Decoration And Mould Field
titanium sputtering target,titanium round target,titanium plate target,titanium rotary target Purity:99.7%-99.995%(3N-4N5) Grain size:<100um Application: 1.architectural glass,car using glass,graphic display field 2.Electronic and semiconductor field 3.Decoration and mould field 4.Optics coating materials
Product Introduction
Titanium sputtering targets designed for thin film deposition in advanced coating technologies. Widely used in semiconductor, optical, solar energy, and decorative coating industries.
Material
Titanium (Ti)
Purity: 99.99% – 99.999%
Grain size: <100 μm
Shapes Available
Round
Plate
Tube
Rotary
Custom shapes available
Standard Sizes
Round Targets
Ø100 × 40 mm
Ø100 × 45 mm
Ø100 × 50 mm
Ø80 × 40 mm
Ø60 × 30 mm
Plate Targets
Length: 200 – 400 mm
Width: 100 – 200 mm
Thickness: 15 – 30 mm
Custom sizes available
Tube Targets
OD127 × ID105 × L
OD219 × ID194 × L
OD300 × ID155 × L
Custom dimensions available
Certifications
ISO 9001:2008
SGS certified
Third-party test reports available
Manufacturing Technology
Vacuum magnetic levitation melting
Ingot casting
Thermo-mechanical processing
Precision machining
Powder metallurgy
Target bonding technology
Quality & Testing Capability
Emission spectroscopy
ICP (Inductively Coupled Plasma)
Atomic absorption spectroscopy
SEM (Scanning Electron Microscopy)
X-ray diffraction (XRD)
Applications
Architectural & automotive glass coatings
Semiconductor & electronics industry
Decorative & mold coating
Optical coating systems
Solar photovoltaic industry
Wear-resistant coatings
Production Capabilities
Powder metallurgy production line
Melting & casting systems
Drilling & precision cutting
Thermo-mechanical treatment
Thermal spraying processes
Key Advantages
Ultra-high purity (99.999%)
Stable sputtering performance
Uniform microstructure
High deposition efficiency
Customization availabl
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