Titanium dioxide TiO2 ceramic sputtering target
Ceramic sputtering target,titanium oxide sputtering target,TiO2 sputtering target
Round:OD25.4mm,OD50mm,OD50.8mm,OD60mm,OD76.2mm,OD80mm,OD101.6mm,OD100mm or as customized
Plate:thickness3mm,4mm,5mm,6mm,6.35mm also can bind copper backplane
Density:≥4.15g/cm3
Resistivity: <10mΩ.cm
Product Introduction
Titanium dioxide tio2 ceramic sputtering target is a specialized material used in the thin film deposition process, which is a common method of coating various surfaces with a thin layer of material. This process is widely used in the electronics industry to produce microelectronic devices, flat-panel displays, solar cells, and other thin film applications.
Sputtering target is a material that is bombarded with high-energy ions to produce a stream of particles that are then deposited onto a substrate, resulting in the formation of a thin film. The properties of the sputtering target are critical to the quality and characteristics of the resulting film.
The 99.99% tio2 titanium dioxide ceramic sputtering target is a high-purity material that consists of 99.99% titanium dioxide. This high purity level is essential in ensuring that the deposited film has a consistent composition, which is essential for the desired properties of the film.
The titanium dioxide sputtering target is typically made by a process called hot pressing, which involves heating and compressing the titanium dioxide powder into a solid block. This process ensures that the material has a uniform density and a smooth surface, which is important for achieving a consistent and high-quality thin film deposition.
Specification
99.99% TiO2 target
Round: OD25.4mm ,OD50mm,OD50.8mm,OD60mm,OD76.2mm,OD80mm,OD101.6mm,OD100mm or as customized
Plate: thickness 3mm,4mm,5mm,6mm,6.35mm also can bind copper backplane
| Ingredient quality control | |
| Raw material composition analysis: | Through ICP equipment detection and analysis, the content of impurity elements to ensure purity meets the standard; through XRD to check whether the powder components are equal |
| Appearance size detection: | Use micrometers and precision calipers to measure product dimensions to ensure compliance with drawings; measure surface finish and cleanliness of products with a surface cleanness meter. |
Flaw detection: | Detect the back target through flaw detection equipment to ensure that the binding layer is uniform and the binding rate is high |
Application case
Titanium dioxide (TiO2) ceramic sputtering targets have a wide range of applications in the electronics, energy, and biomedical industries. Here are a few examples of how titanium dioxide sputtering target are used:
1. Solar Cells: It is widely used in the production of solar cells. Thin films of TiO2 deposited onto a substrate serve as a vital component in dye-sensitized solar cells (DSSC) and perovskite solar cells (PSC). These thin films help to improve the absorption of light and increase the efficiency of the solar cell.
2. Optics: It is are also used in the production of optical coatings for lenses, mirrors, and filters. Thin films of TiO2 are deposited onto the surface of optical elements to improve their performance and reduce glare.
3. Microelectronics: It is used in the production of microelectronic devices such as transistors, capacitors, and integrated circuits. Thin films of TiO2 are deposited onto the substrate to improve the performance and durability of these devices.
4. Biomedical Applications: It is used in biomedical applications such as drug delivery and biosensing. Thin films of TiO2 are deposited onto substrates to create drug-delivery vehicles and biosensors that can be used to diagnose and treat various diseases.
5. Energy Storage: It is also used in energy storage applications, such as lithium-ion batteries. Thin films of TiO2 are deposited onto the electrode surface to improve the battery's performance and lifespan.
In all of these applications, the high-purity and consistency of the titanium dioxide ceramic sputtering target are essential for achieving the desired properties of the thin film. The quality of the sputtering target plays a crucial role in the quality and performance of the final product.
Hot Tags: tio2 ceramic,titanium dioxide ceramic,titanium dioxide sputtering target
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