Titanium sputtering targets are high-purity titanium materials specifically designed for physical vapor deposition (PVD), magnetron sputtering, vacuum coating, and thin-film deposition processes.

Manufactured from high-quality titanium with controlled purity, density, and surface finish, titanium targets provide stable sputtering performance and uniform thin-film deposition.

Our titanium sputtering targets are available in disc, plate, tubular, and customized shapes to meet different coating equipment and vacuum deposition requirements.

Titanium targets are widely used in optical coating, decorative coating, semiconductor-related applications, medical devices, glass coating, vacuum metallization, and other advanced surface engineering industries.

Product Specifications

Parameter	Specification
Product Name	Titanium Sputtering Target
Material	High-Purity Titanium
Shape	Disc / Plate / Tube / Customized
Round Target Diameter	Dia. 25 – 400 mm
Thickness / Length	3 – 28 mm
Surface Finish	Mirror Polished
Manufacturing Method	Machining / Precision Processing
Purity	2N8 – 4N or Customized
Density	Approx. 4.15 g/cm³
Application	PVD / Magnetron Sputtering / Vacuum Coating
Customization	Available According to Drawings

Custom dimensions, purity levels, shapes, and surface requirements can be manufactured according to customer drawings and technical specifications.

Standard Titanium Target Sizes in Stock

Some commonly available titanium disc target sizes include:

Diameter × Thickness
Ø100 × 40 mm
Ø100 × 45 mm
Ø95 × 40 mm
Ø95 × 45 mm

Please contact us for current stock availability.

Other dimensions can be customized according to customer requirements.

Available Shapes

Round Titanium Disc Target

Round titanium targets are commonly used in planar magnetron sputtering systems.

Available size range:

Diameter: 25 – 400 mm

Thickness: 3 – 28 mm

Customized dimensions available

Surface finish:

Mirror polished

Precision machined

Customized surface finish

Titanium Plate Target

Titanium plate targets are suitable for large-area vacuum coating and planar sputtering systems.

Available features include:

Customized length and width

Precision machining

High-purity titanium

Uniform thickness

Customized backing plate compatibility

Titanium Tubular Target

Titanium tubular targets, also known as rotating targets, are designed for rotary magnetron sputtering systems.

Compared with conventional planar targets, rotary targets can offer:

Higher target utilization

Improved coating efficiency

More uniform film deposition

Longer operating time between target replacement

Typical structures include:

Titanium tube targets

Rotating sputtering targets

Customized tubular targets

Titanium Sputtering Target Properties

Titanium is widely used as a sputtering target material because of its excellent physical and chemical properties.

High Purity

High-purity titanium helps ensure stable sputtering performance and reduces the possibility of unwanted impurities affecting thin-film quality.

Available purity:

2N8 – 4N

Customized purity is available according to application requirements.

Stable Density

Titanium targets are manufactured with controlled density to provide stable sputtering performance.

Typical density:

Approximately 4.15 g/cm³

Density and material quality are important factors affecting:

Sputtering stability

Film uniformity

Target utilization

Coating consistency

Mirror Surface Finish

Titanium disc targets can be supplied with a precision-machined and mirror-polished surface.

Advantages include:

Clean surface condition

Improved equipment compatibility

Reduced surface contamination

Stable sputtering performance

Applications of Titanium Sputtering Targets

Titanium sputtering targets are widely used in thin-film deposition and vacuum coating industries.

PVD Coating

Titanium targets are commonly used in Physical Vapor Deposition (PVD) processes.

Applications include:

Decorative coatings

Functional coatings

Wear-resistant coatings

Surface engineering

Magnetron Sputtering

Titanium targets can be used in planar and rotary magnetron sputtering systems.

Typical applications include:

Thin-film deposition

Functional coatings

Optical coatings

Electronic component coatings

Optical Coating

Titanium thin films and titanium-based coatings are used in optical applications.

Typical applications include:

Optical films

Optical communication components

Optical data storage

Precision optical components

Glass Coating

Titanium and titanium alloy sputtering targets are used in architectural and functional glass coating.

Applications include:

Architectural glass

Automotive glass

Optical glass

Decorative glass

Medical Industry

Titanium is widely recognized for its excellent biocompatibility and corrosion resistance.

Titanium targets can be used for coating medical components such as:

Orthopedic implants

Surgical instruments

Medical devices

Biomedical components

Decorative Coatings

Titanium-based coatings are widely used for decorative surface treatment.

Applications include:

Hardware

Consumer products

Architectural components

Decorative metal surfaces

Semiconductor & Electronic Applications

Titanium thin films can be used in specialized electronic and functional coating applications.

Typical fields include:

Electronic components

Functional thin films

Vacuum deposition systems

Advanced material research

Magnetron Sputtering Targets Available

In addition to titanium targets, we can supply various metal and alloy sputtering targets.

Material	Purity	Density (g/cm³)	Available Shape
TiAl Target	2N8 – 4N	3.6 – 4.2	Tube / Disc / Plate
Chromium Target	2N7 – 4N	7.19	Tube / Disc / Plate
Titanium Target	2N8 – 4N	4.15	Tube / Disc / Plate
Zirconium Target	2N5 – 4N	6.5	Tube / Disc / Plate
Aluminum Target	4N – 5N	2.8	Tube / Disc / Plate
Nickel Target	3N – 4N	8.9	Tube / Disc / Plate
Copper Target	3N – 4N5	8.92	Tube / Disc / Plate
Brass Target	3N – 4N5	Approx. 8.9	Tube / Disc / Plate
Tantalum Target	3N5 – 4N	16.68	Tube / Disc / Plate

Customized dimensions and compositions are available upon request.

Typical Titanium Tubular Target Dimensions

Customized titanium tube targets are available for rotary magnetron sputtering systems.

Typical dimensions may include:

OD127 × ID105 × Length

OD219 × ID194 × Length

OD300 × ID155 × Length

Other dimensions can be manufactured according to customer drawings.

Titanium Alloy Sputtering Targets

Titanium alloy targets can also be supplied for specialized coating applications.

TiAl Target

TiAl sputtering targets are widely used for advanced surface coatings and thin-film applications.

Available forms:

Disc

Plate

Tube

Customized shape

Typical applications include:

Flat panel displays

Architectural glass coating

Automotive glass

Optical glass

Thin-film solar cells

Decorative coatings

Tool coatings

Automotive headlight coatings

Manufacturing Process

Titanium sputtering targets are manufactured through controlled material preparation and precision machining.

Typical manufacturing process:

Raw Material Selection
→ Material Inspection
→ Cutting
→ Forging or Forming
→ Heat Treatment
→ Precision Machining
→ Surface Grinding
→ Mirror Polishing
→ Dimensional Inspection
→ Cleaning
→ Final Inspection
→ Vacuum or Protective Packaging

The production process can be adjusted according to target size, purity requirements, density requirements, and application conditions.

Quality Control

Strict quality inspection is performed before shipment.

Typical inspection items include:

Chemical Composition Testing

Material purity and chemical composition can be verified according to customer requirements.

Density Testing

Density inspection helps ensure material consistency and stable sputtering performance.

Dimensional Inspection

Critical dimensions including:

Diameter

Thickness

Length

Inner diameter

Outer diameter

are inspected according to customer drawings and tolerances.

Surface Inspection

Surface quality inspection may include:

Visual inspection

Surface roughness inspection

Flatness inspection

Mirror finish verification

Material Certification

Material certificates and inspection reports can be supplied according to customer requirements.

Available documentation may include:

Chemical composition report

Density test report

Dimensional inspection report

Material certificate

Certificate of conformity

Why Choose Our Titanium Sputtering Targets?

High-Quality Raw Materials

Carefully selected titanium materials provide stable physical and chemical properties.

Precision Machining

Advanced machining equipment ensures accurate dimensions and good surface quality.

Mirror Surface Finish

Precision polishing provides a clean and smooth target surface.

Customized Solutions

Targets can be manufactured according to:

Customer drawings

Sputtering equipment specifications

Required purity

Target dimensions

Coating process requirements

Multiple Target Materials Available

In addition to titanium targets, we can supply:

Titanium Aluminum (TiAl)

Chromium (Cr)

Zirconium (Zr)

Aluminum (Al)

Nickel (Ni)

Copper (Cu)

Brass

Tantalum (Ta)

Packaging & Delivery

Titanium sputtering targets are carefully packed to prevent surface damage during transportation.

Typical packaging includes:

Protective film

Vacuum packaging when required

Foam protection

Shock-resistant packaging

Standard export wooden case

Special packaging can be provided for precision-machined and mirror-polished targets.

Request a Quote

To receive an accurate quotation for Titanium Sputtering Targets, please provide:

Target material

Purity requirement

Shape

Diameter or dimensions

Thickness

Length

Quantity

Surface finish requirement

Drawing, if available

Application or sputtering equipment information

Our technical team can manufacture customized titanium sputtering targets and other metal targets according to your specific coating requirements.

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