NiCr 80:20 wt% sputtering targets
Nickel Chromium sputtering targets (NiCr 80:20wt%)
NiCr(80:20wt%),Ni80Cr20,NiCr8020,NiCr80/20wr%
Purity:99.5%(2N5)
Dimension(mm):Thickness 16(+/-0.1) x Width 170(+/-0.5) x Length 2050/2300mm,other size as customized
Resistance (μΩ.m):>140
Ultimate Strength (≥ MPa):440
Elongation (≥ %):20%
Shape:plate,tube
Relative Density:>=99.7%
Technique:forge and machining
Surface:Metallic color and bright psurface Ra1.6
Flatness:0.15-0.2mm
Product Introduction
Product Description
NiCr 80:20 wt% sputtering targets are composed of 80% nickel and 20% chromium alloy and are widely used in physical vapor deposition (PVD) processes, especially magnetron sputtering coating technology.
NiCr targets are commonly used for producing thin-film resistors, electronic contacts, corrosion-resistant coatings, and functional optical coatings.
These targets are manufactured under strict quality control to ensure excellent composition uniformity, stable sputtering performance, and long service life.
General Information
Material: NiCr (80/20 wt%)
Alloy Grade: Ni80Cr20 / NiCr8020
Purity: 99.5% (2N5) – 99.95% (3N5)
Manufacturing Process: Melting and forging, followed by precision machining
Physical & Chemical Properties
| Property | Value |
|---|---|
| Density | 8.4 g/cm³ |
| Melting Point | ~1400°C |
| Maximum Use Temperature | ~1200°C |
| Resistivity (20°C) | 1.09 ± 0.05 μΩ·m |
| Elongation | ≥20% |
| Specific Heat | 0.440 J/g·K |
| Thermal Conductivity | 60.3 KJ/m·h |
| Linear Expansion Coefficient | 18 × 10⁻⁶ /K |
| Microstructure | Austenitic |
| Magnetic Property | Non-magnetic |
Standard Dimensions
Thickness: 16 mm ±0.1 mm
Width: 170 mm ±0.5 mm
Length: 2050 mm / 2300 mm (no splicing)
Custom dimensions available according to customer drawings.
Applications
Architectural & Automotive Glass Coating
Low-emissivity (Low-E) glass coating
Automotive windshield coating
Decorative and functional glass films
Electronics & Semiconductor Industry
Thin film resistors
Electronic contact coatings
Microelectronic components
Optical & Display Industry
Optical lens coating
Display panel coating
Decorative & Mold Surface Coating
Wear-resistant and corrosion-resistant surface layers
Advantages
Stable sputtering performance
Excellent corrosion and heat resistance
Uniform film composition
Low temperature coefficient of resistance
High sensitivity coefficient
Suitable for precision thin film applications
Heat Treatment & Microstructure Control
The microstructure and composition uniformity of NiCr alloys are highly sensitive to heat treatment processes:
At 1000–1200°C, Ni content in BCC phase varies from 5% to 30%.
Homogenization heat treatment is typically performed at 1200–1300°C when Ni atomic content is 20–70%.
Heat treatment duration ranges from 2–24 hours, depending on temperature and grain control requirements.
Proper heat treatment ensures uniform alloy structure and prevents excessive grain growth.
Sputtering Performance Characteristics
Similar atomic surface energies of Ni and Cr ensure stable sputtering composition transfer.
The alloy film maintains high resistivity and low temperature coefficient of resistance.
Suitable for strain gauge and precision resistance film manufacturing.
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