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Chromium Target

Chromium target,Cr target,Chromium sputtering target
Purity:99.5%-99.99%
Rectangular target, Round target,rotary target
Forming process: hot isostatic pressing(HIP)
Conventional size: ID55*OD70*L, ID125*OD153*L, φ100*40mm, φ150*30mm, φ155*30, φ80*40mm etc
Application: decorative coating,tool coating,flat display coating,thin film solar industry,flat panel display industry,energy-saving glass industry,optical coating industry(such as automobile rearview mirror coating) etc

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Product Introduction

Specification

Purity: 99.5%~99.95%;

Forming process: hot isostatic pressing(HIP);

Conventional size: ID55*OD70*L, ID125*OD153*L, φ100*40mm, φ150*30mm, φ155*30, φ80*40mm, etc.;

Application: decorative coating, tool coating, flat display coating, thin film solar industry, flat panel display industry, energy-saving glass industry, optical coating industry (such as automobile rearview mirror coating), etc.

Chromium		Product performance
Purity		99.5	99.95
Density g/cm3		≥7.12	≥7.12
Grain size/μm		≤100	≤100
Total content of metallic impurities/ppm		≤5000	≤500
Thermal conductivity/W/m.K		60	100
Coefficient of thermal expansion/1/K		8×10-6	8×10-6
Size/mm	Planar	≤1600×500	≤1600×500
	Rotating	Integral formingby HIP Length≤4000 Thickness≤15	Integral formingby HIP Length≤4000 Thickness≤15

2N5 (Trace elements)PPM ≥7.12g/cm3

Composition	Fe	Al	Si	C	S	O	N
Standard	≤1500	≤1200	≤1500	≤200	≤50	≤1400	≤300
Test values	980	300	600	62	50	1200	200

2N8 (Trace elements)PPM ≥7.12g/cm3

Composition	Fe	Al	Si	C	S	O	N
Standard	≤800	≤300	≤400	≤200	≤50	≤1000	≤100
Test values	740	78	92	84	50	340	30

3N (Trace elements)PPM ≥7.12g/cm3

Composition	Fe	Al	Si	C	S	O	N
Standard	≤500	≤100	≤150	≤150	≤30	≤500	≤100
Test values	290	47	80	90	28	450	50

3N5 (Trace elements)PPM ≥7.12g/cm3

Composition	Fe	Al	Si	Cu	Ｎi	C	S	O	N
Standard	≤100	≤50	≤50	≤10	≤50	≤50	≤30	≤150	≤80
Test values	50	45	40	7	10	24	27	137	30

High-purity chromium particles: commonly used particle sizes are: 1-3mm, 3-5mm, 40 mesh, -20-300 mesh, 40#, 60#, 80#, 200#, etc. for evaporation coating, high purity, good evaporation effect.

application case

Chromium sputtering targets are commonly used in thin film deposition processes, such as physical vapor deposition (PVD) and magnetron sputtering. These processes are used in various industries, including semiconductor, electronics, aerospace, and automotive, to deposit thin layers of materials onto substrates for various purposes, such as enhancing the material's properties or creating a specific surface finish.

It have excellent adhesion properties, high melting points, and are chemically stable, making them ideal for use in these processes. They are used to deposit thin films of chromium onto various substrates, such as glass, metal, and ceramic, to create various functional and decorative coatings.

One application of chromium Cr targets is in the semiconductor industry, where they are used to create thin film layers of chromium for various purposes, such as electrode interconnects, barrier layers, and ohmic contacts. These layers are essential components of semiconductor devices, and their properties can greatly affect the performance and reliability of the devices.

In the aerospace and automotive industries,they are used to create protective coatings on engine components, such as turbine blades and exhaust systems, to improve their durability and resistance to high-temperature environments.

In the electronics industry, Cr sputtering target are used to deposit thin films onto various substrates, such as displays and touchscreens, to enhance their performance and durability.

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