Zirconium Plate Target
Material: Zirconium Purity: 99.5%(2N5)-99.995%(4N5) Shape: Square, rectangular
Product Introduction
Zirconium plate targets are high-purity zirconium materials designed for use in physical vapor deposition (PVD), magnetron sputtering, and other thin-film deposition processes. During sputtering, energetic ions bombard the zirconium target surface, causing zirconium atoms to be released and deposited onto a substrate to form a thin coating.
Changsheng Titanium supplies zirconium plate targets in different purities, dimensions, and surface conditions. Custom sizes and zirconium-based alloy targets, such as Ti-Zr and Nb-Zr, can also be manufactured according to customer drawings and deposition-system requirements.
Zirconium Target for PVD and Sputtering
Zirconium targets are commonly selected when a zirconium-containing thin film is required for functional, protective, decorative, optical, or electronic applications.
The target material is consumed gradually during the sputtering process. Target purity, chemical composition, microstructure, surface condition, dimensions, and bonding configuration can all influence deposition stability and coating quality.
For this reason, zirconium targets can be manufactured according to the specific requirements of the customer's PVD or sputtering equipment.
Key Features
High Purity
Zirconium targets are available in purity levels from approximately 99.5% to 99.995%, depending on the application.
Higher-purity material can be supplied for applications where control of metallic and gas impurities is important.
Good Corrosion Resistance
Zirconium has excellent corrosion resistance in many aggressive chemical environments, making zirconium-based materials suitable for demanding industrial applications.
High Melting Point
Zirconium has a high melting point and good thermal stability, which are useful characteristics for sputtering and other high-temperature processing environments.
Controlled Microstructure
Target grain size and microstructure can be controlled according to the manufacturing process and application requirements.
Customized Dimensions
Planar zirconium targets can be supplied in rectangular or other customized configurations according to target dimensions, chamber design, and sputtering equipment.
Technical Specifications
| Item | Specification |
|---|---|
| Material | Zirconium |
| Purity | 99.5%–99.995% |
| Shape | Planar / Plate |
| Typical Size | 12 × 132 × 1701 mm |
| Size Range | L 200–2000 mm × W 40–500 mm × T 1–50 mm |
| Surface Roughness | Ra 0.8–Ra 3.2 μm |
| Grain Size | <200 μm |
| Customization | Available according to drawing |
Dimensions, purity, grain size, surface finish, and other requirements can be customized according to the customer's sputtering system and application.
Manufacturing Process
The manufacturing process is selected according to target purity, dimensions, microstructure, and application requirements.
1. Raw Material Preparation
Zirconium raw material is selected and prepared according to the required purity and chemical composition.
2. Melting and Alloy Preparation
For high-purity or alloy targets, controlled melting and homogenization processes are used to achieve the required composition and material uniformity.
3. Hot Working / Forming
The material is processed into the required plate or target geometry through appropriate forming and working processes.
4. Heat Treatment
Heat treatment may be applied to obtain the required microstructure and material condition.
5. Machining
Target dimensions, mounting holes, edges, and other features are machined according to customer drawings.
6. Surface Finishing
The target surface is processed to meet the specified roughness and surface-quality requirements.
7. Inspection
Final inspection includes dimensional, surface, chemical composition, and other applicable quality checks.
Applications
Zirconium targets are used in thin-film deposition and surface-coating applications, including:
PVD Coatings
Decorative coatings
Functional coatings
Wear-resistant coatings
Protective coatings
Optical coatings
Electronics & Semiconductor
Semiconductor-related thin films
Electronic components
Functional thin-film applications
Optical Applications
Optical coatings
Reflective and functional coatings
Specialty glass coatings
Solar & Energy
Thin-film solar technologies
Functional energy-related coatings
Advanced Materials
Research and development
Laboratory sputtering
Specialty coating systems
Advanced surface engineering
The final coating composition and performance depend on target material, reactive gases, substrate, power conditions, deposition temperature, and other process parameters.
Zirconium Targets for Reactive Sputtering
Zirconium targets can also be used in reactive sputtering processes, where gases such as nitrogen or oxygen are introduced into the deposition chamber.
Depending on the process conditions, zirconium-containing films such as zirconium nitride or zirconium oxide can be produced.
Reactive sputtering parameters can be adjusted according to the desired:
Film composition
Hardness
Color
Optical properties
Wear resistance
Chemical resistance
Electrical properties
The target composition should therefore be selected together with the intended coating chemistry and deposition process.
Packaging & Delivery
Zirconium targets are carefully packaged to prevent contamination, scratches, deformation, and surface damage during transportation.
Typical packaging includes:
Protective film or clean packaging
Moisture protection where required
Individual protection for finished target surfaces
Inner cushioning
Export wooden cases
Special clean packaging can be provided for high-purity target materials and sensitive coating applications.
Frequently Asked Questions
What purity levels are available for zirconium targets?
Zirconium plate targets can be supplied in purity levels from approximately 99.5% to 99.995%, depending on the target size and application.
What zirconium target shapes are available?
The standard configuration is a planar rectangular plate target, while customized shapes and dimensions can be manufactured according to drawings.
Can you supply Ti-Zr or Nb-Zr targets?
Yes. Ti-Zr, Nb-Zr, and other zirconium-based alloy targets can be customized according to the required alloy composition.
Can you provide large zirconium plate targets?
Yes. Large planar targets can be manufactured according to the target dimensions and production requirements. The actual maximum size depends on material purity, thickness, equipment, and target design.
What surface roughness can you provide?
The reference surface roughness range is approximately Ra 0.8–Ra 3.2 μm, with tighter or different requirements available according to the application.
Can you provide chemical analysis reports?
Yes. Chemical composition and impurity analysis can be provided according to the agreed material specification, together with an MTC where required.
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